Polovodiče

Oblast zaměření: Polovodiče
Komise : IEC/TC 47 (Semiconductor devices)
Původce: ISO\IEC\CEN\CENELEC
K připomínkám do: 13.02.2026
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This part of IEC 63567-1 proposes a method of measuring the transmittance of extreme ultraviolet (EUV) pellicle used for extreme ultraviolet lithography (EUVL) and provides guidelines on the conditions of the transmittance measurement instrument using EUV with a short wavelength and methods for calculating EUV transmittance.

The scope of this document applies to all types of membranes attached to the front side of a reflective mask (or reflective reticle) used in EUVL to physically protect the reflective mask from contaminant particles generated inside the chamber during EUV exposure.